IITS

ion implant test site
(半導体基板の)イオン注入試験位置.
ion implant test site; on a semiconductor wafer; is diffused, metallized, and testedon an automated tester; capable of measuring implant uniformity down to dose levels 1012 with the use of 100 ohm-cm wafers; used to generate sheet re

![]() | 丸善 「略語大辞典」 JLogosID : 11878362 |